M06200 - SEMI M62 - Specification for Silicon Epitaxial Wafers Revision:SEMI M62-1125 - Current + Redline Searchable by fab

Searchable by fab

This Guide specifies the technique for collecting and analyzing Nanotopography data

or vacuum) utilizing a technique such as detecting light from a sample region of the environment’s space

These test methods are not suitable for determining the width or characteristics of a ‘denuded zone’

This specification was technically approved by the global Flat Panel Display Committee and is the direct responsibility of the North American Flat Panel Display Committee

M06200 - SEMI M62 - Specification for Silicon Epitaxial Wafers Revision:SEMI M62-1125 - Current + Redline Searchable by fab* This Standard has the option to purchase the Current document with a redline document (Current + Redline). The redline document is included with the Current document as a comparison tool to help identify changes that have been made between the Current version and the previous version (Superseded). If differences should exist between the redline document and the Current document, the Current version is the official and authoritative version. 1