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Historical 300mm Fab Report (2011-2022) StdPbc-1110 This standard is intended to

SKU: 78680146808
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Description

This standard is intended to assist automatic recipe generation of wafer exposure tools

本文書の目的は，エピタキシァル層のキャリア濃度深さプロファイルを電気化学キャパシタンスボルテージ（ECV）プロファイリングによって，測定する方法を規定することである。

This Document provides guidance on how CMP PSD should be reported on a CoA

SEMI C88-0815 (first published)

2 150mm鏡面研磨単結晶シリコンウェーハ（オリフラあり，セカンダリフラットなし，T/4エッジプロファイル）

Historical 300mm Fab Report (2011-2022) StdPbc-1110 This standard is intended to

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