P03400 - SEMI P34 - 230mm方形フォトマスク基板の仕様 Revision:SEMI P34-0200 (Reapproved 0707) - Inactive 8 for further information

8 for further information

本スタンダードでは，FPDカラーフィルタに使用される高抵抗樹脂ブラックマトリクス（BM）の指定された特性を測定するための実施要領を確立するものとする。これらの方法は，製造，品質管理，および開発業務に応用することができる。

The scope of this Document covers high purity zirconium tert-butoxide which is used in the semiconductor industry for the deposition of zirconium oxide based layers by atomic layer deposition or chemical vapor deposition

and bulk properties

It is envisioned that this Guide can be used for internal factory and equipment optimization

P03400 - SEMI P34 - 230mm方形フォトマスク基板の仕様 Revision:SEMI P34-0200 (Reapproved 0707) - Inactive 8 for further informationNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI global Micropatterning Committee2007425global Audits and Reviews Subcommittee20076www. semi. org20002 NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been