P04500 - SEMI P45 - マスク装置向けジョブデック・データフォーマットの仕様 Revision:SEMI P45-0708 - Superseded This Standard is intended to

This Standard is intended to set an appropriate level of specification that places minimal limits on innovation while ensuring modularity and inter-changeability at all mechanical interfaces

this Standard provides:

3  This Guide also applies to wafers or other geometrical shapes of any material type that show deflections more than 200% of the allowable bow tolerance when tested for bow using the conventional three-point mounting method

The second part (§ 9) specifies the presentation (i

The components here include such consumable materials as sputtering gun with target material and repeatedly used chemicals in bath or container

P04500 - SEMI P45 - マスク装置向けジョブデック・データフォーマットの仕様 Revision:SEMI P45-0708 - Superseded This Standard is intended toglobal Micropatterning Committee2008513global Audits and Reviews Subcommittee20086www. semi. org20087CD ROM20063 MALY Referenced SEMI Standards SEMI P39 OASISTM Open Artwork System Interchange Standard SEMI P44 Specification for Open Artwork System Interchange Standard (OASISTM) Specific to Mask Tools