P04600 - SEMI P46 - Specification for Critical Dimension (CD) Measurement Information Data on Photomask by XML Revision:SEMI P46-0706 - Superseded SEMI M2 — Specifications for

SEMI M2 — Specifications for Silicon Epitaxial Wafers for Discrete Device Applications

• To provide data quality reporting compliance methods

This Safety Guideline is intended to be used by those working or doing research in semiconductor-related technology

Acceptable equipment

特定のウェーハの重要なパラメータを記載した発注書の様式の項の1つではあるが，そのウェーハの仕様書の発注書に記載されていない項に責任があるグループからの新たな追加を要求する方法。

P04600 - SEMI P46 - Specification for Critical Dimension (CD) Measurement Information Data on Photomask by XML Revision:SEMI P46-0706 - Superseded SEMI M2 — Specifications forThis Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on September 12, 2011. Available at www. semiviews. org and www. semi. org in November 2011; originally published July 2006. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards