F03300 - SEMI F33 - Test Method for Calibration of Atmospheric Pressure Ionization Mass Spectrometer (APIMS) Revision:SEMI F33-0708 - Inactive This Specification defines the properties

This Specification defines the properties of silicon epitaxial wafers with buried layers that relate to the characteristics of photolithography

are the thickness and the optical properties of fabricated layers and the critical dimensions (CD) of submicron structures

25 mm (including full-cell and half-cell)

in order to improve the consistency of wafer marking and allow simplification of the performance requirement of automatic optical character recognition (OCR) equipment

The work activities to which this Safety Guideline applies include installation

F03300 - SEMI F33 - Test Method for Calibration of Atmospheric Pressure Ionization Mass Spectrometer (APIMS) Revision:SEMI F33-0708 - Inactive This Specification defines the propertiesThis standard was technically approved by the global Gases Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 13, 2008. It was available at www. semi. org in June 2008. Originally published in 1998. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and