P02100 - SEMI P21 - Guidelines for Precision and Accuracy Expression for Mask Writing Equipment Revision:SEMI P21-92 (Reapproved 0703) - Inactive may be present

may be present

NOTICE: This document was withdrawn in accordance with the Regulations Governing SEMI® Standards in 2003

but with advanced technologies

1-1019 (technical revision)

unless specified as a solid "deposited layer" derived from the gaseous source

P02100 - SEMI P21 - Guidelines for Precision and Accuracy Expression for Mask Writing Equipment Revision:SEMI P21-92 (Reapproved 0703) - Inactive may be presentThis guideline was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on April 28, 2003. Initially available at www. semi. org June 2003; to be published July 2003. Originally published in 1992. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain